Prediction of the liquid film characteristics in open inclined microchannels

Falling film microreactors (FFMR) are important gas-liquid microdevices, in which extended specific surfaces (up to 20,000 m/m) can be obtained while the formed liquid film remains stable over a wide range of gas and liquid flow rates [1]. The advantages offered by these devices, i.e. enhanced heat and mass transfer capabilities, attracted the interest of many researchers and as a result various papers concerning the design and operation of FFMRs have been published during the last decade.