Negative ion source for the tandem accelerator
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T. Uchiyama | K. Takagi | T. Nishihashi | T. Katagawa | H. Tsuboi | Agawa Yoshiaki | N. Ueda | A. Isoya | R. Kikuchi | Y. Mihara | H. Yamakawa
[1] G. Norton,et al. Production MeV ion implanters for energies from 200 keV to 4 MeV , 1987 .
[2] M. Sieradzki,et al. Design considerations of a VLSI compatible production MeV ion implantation system , 1987 .
[3] T. Sluyters,et al. A hollow discharge duoplasmatron as a negative hydrogen ion source , 1973 .