Improvement of silicon etching resolution using the confined etchant layer technique
暂无分享,去创建一个
Zhao-Wu Tian | Zhaoxiong Xie | Bing-Wei Mao | B. Mao | Zhaoxiong Xie | Z. Tian | Yanbing Zu | Lei Xie | Jiqian Mu | Y. Zu | Jiqian Mu | Lei Xie
[1] A. Bard,et al. Hole Injection and Etching Studies of GaAs Using the Scanning Electrochemical Microscope , 1990 .
[2] Guy Denuault,et al. Scanning electrochemical microscopy - a new technique for the characterization and modification of surfaces , 1990 .
[3] A. Bard,et al. Scanning Electrochemical Microscopy: The Application of the Feedback Mode for High Resolution Copper Etching , 1989 .
[4] S. Meltzer,et al. Study of silicon etching in HBr solutions using a scanning electrochemical microscope , 1995 .
[5] A. Bard,et al. High Resolution Etching of Semiconductors by the Feedback Mode of the Scanning Electrochemical Microscope , 1990 .
[6] Zhong-Qun Tian,et al. Confined etchant layer technique for two-dimensional lithography at high resolution using electrochemical scanning tunnelling microscopy , 1992 .