Nano-width lines using lateral pattern definition technique for nanoimprint template fabrication

One of the most promising approaches to next generation lithography is nanoimprinting where a mechanical template is used as a patterning tool. In this paper we present an innovative technique enabling simple and cost-effective fabrication of transparent nanoimprint templates. The nanoimprint template is a line pattern in silicon oxide on a quartz substrate. The oxide nano-lines are created by lateral oxidation at the step edges of a pattern formed previously in a silicon layer. The width of the line is precisely controlled by progress of the lateral oxidation. Removing of the remaining silicon by plasma etching results in a free standing "fence" of the material produced as a result of the chemical transformation.