Chemical composition of an inductively coupled hexamethyldisilazane–argon plasma and properties of films grown in this plasma

[1]  F. A. Kuznetsov,et al.  Synthesis of thin silicon carbonitride films from hexamethyldisilazane in an inductively coupled plasma reactor , 2015, Inorganic Materials.

[2]  M. Belmahi,et al.  Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2/N2/Ar/Hexamethyldisilazane Gas Mixture , 2014 .

[3]  V. Shayapov,et al.  Mechanical stresses in silicon carbonitride films obtained by PECVD from hexamethyldisilazane , 2013 .

[4]  V. Shayapov,et al.  Optical and mechanical properties of films obtained by plasma decomposition of hexamethyldisilazane , 2012, Russian Journal of Physical Chemistry A.

[5]  B. Beckhoff,et al.  Silicon carbonitride nanolayers - Synthesis and chemical characterization , 2012 .

[6]  N. Fainer From organosilicon precursors to multifunctional silicon carbonitride , 2012, Russian Journal of General Chemistry.

[7]  R. D'agostino,et al.  GC‐MS Investigation of Hexamethyldisiloxane–Oxygen Fed Cold Plasmas: Low Pressure Versus Atmospheric Pressure Operation , 2011 .

[8]  W. Ensinger,et al.  Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films , 2011 .

[9]  F. Palumbo,et al.  Thin Film Deposition in Capacitively Coupled Plasmas Fed with Bis(dimethylamino)dimethylsilane and Oxygen: An FTIR study , 2009 .

[10]  Yujun Shi,et al.  Decomposition of hexamethyldisilane on a hot tungsten filament and gas-phase reactions in a hot-wire chemical vapor deposition reactor. , 2008, Physical chemistry chemical physics : PCCP.

[11]  J. Heberlein,et al.  Thermal plasma chemical vapor deposition of wear-resistant, hard Si–C–N coatings , 2006 .

[12]  H. Hoche,et al.  Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry , 2005 .

[13]  R. D'agostino,et al.  Process control of organosilicon plasmas for barrier film preparations , 1998 .

[14]  G. Marx,et al.  High power deposition and analytics of amorphous silicon carbide films , 1995 .

[15]  P. Favia,et al.  Plasma and Surface Diagnostics in PECVD Silicon Containing Organic Monomers. , 1994 .

[16]  P. Favia,et al.  Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers , 1994 .

[17]  P. Favia,et al.  Thin film deposition in glow discharges fed with hexamethyldisilazane-oxygen mixtures , 1993 .

[18]  A. Shterenberg,et al.  Changes in the mass spectra and molecular composition in a glow discharge in hexamethyldisilazane and hexamethyldisilozane vapors , 1986 .

[19]  M. Kryszewski,et al.  Preparation, structure, and some properties of organosilicon thin polymer films obtained by plasma polymerization , 1991 .

[20]  G. Dieke The hydrogen molecule wavelength tables of Gerhard Heinrich Dieke , 1972 .

[21]  A. G. Gaydon,et al.  The identification of molecular spectra , 1950 .