Effect of heating ramp rates on transient enhanced diffusion in ion-implemented silicon
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Fred Roozeboom | Pierre H. Woerlee | Giovanni Mannino | W. B. de Boer | P. Stolk | G. Mannino | F. Roozeboom | P. Woerlee | A. Dirks | Peter A. Stolk | N. E. B. Cowern | A. G. Dirks | J. G. M. van Berkum | N. N. Toan | J. V. Berkum | W. Boer | N.E.B. Cowern
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