Deep insight into the voltage amplification effect from ferroelectric negative capacitance
暂无分享,去创建一个
Qianqian Huang | Huimin Wang | Mengxuan Yang | Xing Zhang | Ru Huang | Ru Huang | Qianqian Huang | Xing Zhang | Huimin Wang | Mengxuan Yang
[1] Yoshihiro Ishibashi,et al. Note on Ferroelectric Domain Switching , 1971 .
[2] Bo Li,et al. Total ionizing dose effects and annealing behaviors of HfO2-based MOS capacitor , 2017, Science China Information Sciences.
[3] J. Kittl,et al. Ferroelectric Switching Delay as Cause of Negative Capacitance and the Implications to NCFETs , 2018, 2018 IEEE Symposium on VLSI Technology.
[4] S. M. Sze,et al. Physics of semiconductor devices , 1969 .
[5] W. J. Merz. Switching Time in Ferroelectric BaTiO3 and Its Dependence on Crystal Thickness , 1956 .
[6] Ru Huang,et al. New Insights into the Physical Origin of Negative Capacitance and Hysteresis in NCFETs , 2018, 2018 IEEE International Electron Devices Meeting (IEDM).
[7] U. Böttger,et al. Ferroelectricity in hafnium oxide thin films , 2011 .
[8] Dan Wang,et al. High energy proton and heavy ion induced single event transient in 65-nm CMOS technology , 2017, Science China Information Sciences.
[9] S. Sze,et al. Physics of Semiconductor Devices: Sze/Physics , 2006 .
[10] S. Datta,et al. Use of negative capacitance to provide voltage amplification for low power nanoscale devices. , 2008, Nano letters.