Preface

This book is the result of a dissertation work at the Helmholtz-Zentrum Dresden-Rossendorf based on a contract with the centrotherm AG at Blaubeuren/Germany. The background is the need to find out more sophisticated approaches for measuring temperatures in the time range below one second down to the millisecond range. The need for that results from the most advanced Silicon technology and other applications using modern lampbased annealing techniques for thermal treatments of substrates where the activation of electrical, optical and other functions is needed at negligible impurity diffusion and/or thermal load to the substrate.