Influence of the substrate on the solid-state reaction of ultra-thin Ni film with a In0.53Ga0.47As under-layer by means of full 3D reciprocal space mapping
暂无分享,去创建一个
Ph Rodriguez | F. Nemouchi | P. Gergaud | F. Nemouchi | S. Zhiou | P. Rodriguez | P. Gergaud | S. Zhiou | T. Nguyen Thanh | T. Thanh | P. Rodriguez
[1] Hiroshi Iwai,et al. Roadmap for 22nm and beyond (Invited Paper) , 2009 .
[2] J. Alamo. Nanometre-scale electronics with III–V compound semiconductors , 2011, Nature.
[3] F. Nemouchi,et al. Full 3D reciprocal space map of thin polycrystalline films for microelectronic applications , 2015, 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM).
[4] Xiao Gong,et al. A Self-Aligned Ni-InGaAs Contact Technology for InGaAs Channel n-MOSFETs , 2012 .
[5] J. Caulet,et al. Metallurgical study of Ni/GaAs contacts. II. Interfacial reactions of Ni thin films on (111) and (001) GaAs , 1989 .
[6] M. Eizenberg,et al. Epitaxial NiInGaAs formed by solid state reaction on In0.53Ga0.47As: Structural and chemical study , 2013 .
[7] C. Detavernier,et al. Three dimensional reciprocal space measurement by x-ray diffraction using linear and area detectors: Applications to texture and defects determination in oriented thin films and nanoprecipitates , 2013 .
[8] Ivana,et al. Crystal structure and epitaxial relationship of Ni4InGaAs2 films formed on InGaAs by annealing , 2013 .
[9] E. A. Stach,et al. An off-normal fibre-like texture in thin films on single-crystal substrates , 2003, Nature.