Modeling of Passive Components for Radio Frequency Applications

This paper presents a fast and accurate modeling technique of passive components for analog RF integrated circuits on silicon. Key components such as a single interconnection, coupled lines and planar inductors were chosen to illustrate the advantageous features of the method. First, we present the analysis of a single interconnection as regards the frequency range and the silicon substrate conductivity. By using a Spectral Domain Approach to compute electric field distribution, we demonstrate the existence of a skin-effect in the silicon substrate of CMOS technologies. The equivalent model of a single transmission line including the complex loss mechanisms relevant to such a “skin-effect” mode is then extracted from geometrical and technological data. In the case of two coupled lines, the additional electric and magnetic coupling between segments of finite length is computed using the Integral Equation method and analytical formulation. Then, the simplicity and accuracy of the technique enable the modeling of more complex components such as RF planar inductors. Few time and memory resources are required to extract the fully scalable SPICE model of the component. Moreover, excellent agreement is observed between simulated results and measured S-parameters responses for all the devices.

[1]  J. Lescot,et al.  Accurate and Fast Modelling of Planar Inductors in CMOS Technologies , 1999, 29th European Solid-State Device Research Conference.

[2]  B. Courtois,et al.  Micromachined planar spiral inductor in standard GaAs HEMT MMIC technology , 1998, IEEE Electron Device Letters.

[3]  Gordon G. Rabjohn Monolithic microwave transformers. , 1991 .

[4]  T.H. Lee,et al.  A physical model for planar spiral inductors on silicon , 1996, International Electron Devices Meeting. Technical Digest.

[5]  R. Meyer,et al.  Si IC-compatible inductors and LC passive filters , 1990 .

[6]  H. Hasegawa,et al.  Analysis of interconnection delay on very high-speed LSI/VLSI chips using an MIS microstrip line model , 1984, IEEE Transactions on Electron Devices.

[7]  H. Greenhouse,et al.  Design of Planar Rectangular Microelectronic Inductors , 1974 .

[8]  O. Kenneth,et al.  Estimation methods for quality factors of inductors fabricated in silicon integrated circuit process technologies , 1998, IEEE J. Solid State Circuits.

[9]  Ingo Wolff,et al.  CAD models of lumped elements on GaAs up to 18 GHz , 1988 .

[10]  J. Long,et al.  The modeling, characterization, and design of monolithic inductors for silicon RF IC's , 1997, IEEE J. Solid State Circuits.

[11]  W. R. Eisenstadt,et al.  High-speed VLSI interconnect modeling based on S-parameter measurements , 1993 .

[12]  R. Mittra,et al.  Spectral-Domain Approach for Calculating the Dispersion Characteristics of Microstrip Lines (Short Papers) , 1973 .

[13]  K. Jenkins,et al.  Integrated RF components in a SiGe bipolar technology , 1997 .

[14]  D. Dawson,et al.  A Closed-Form Expression for Representing the Distributed Nature of the Spiral Inductor , 1986, Microwave and Millimeter-Wave Monolithic Circuits.

[15]  D. Edelstein,et al.  RF circuit design aspects of spiral inductors on silicon , 1998, 1998 IEEE International Solid-State Circuits Conference. Digest of Technical Papers, ISSCC. First Edition (Cat. No.98CH36156).

[16]  J. Leclercq,et al.  Monolithic micromachined planar spiral transformer , 1998, GaAs IC Symposium. IEEE Gallium Arsenide Integrated Circuit Symposium. 20th Annual. Technical Digest 1998 (Cat. No.98CH36260).

[17]  Keith A. Jenkins,et al.  Multilevel monolithic inductors in silicon technology , 1995 .

[18]  H. Hasegawa,et al.  Properties of Microstrip Line on Si-SiO/sub 2/ System , 1971 .

[19]  M. Pardoen,et al.  Reducing the substrate losses of RF integrated inductors , 1998 .

[20]  C. Yue,et al.  On-chip Spiral Inductors With Patterned Ground Shields For Si-based RF IC's , 1997, Symposium 1997 on VLSI Circuits.