Impact of Charge trapping on Imprint and its Recovery in HfO2 based FeFET
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S. Clima | D. Linten | B. O’Sullivan | B. Kaczer | U. Celano | J. van Houdt | S. Mcmitchell | N. Ronchi | K. Banerjee | L. di Piazza | A. Minj | Y. Higashi | M. Suzuki