Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides

Abstract. We demonstrate maskless lithography fabrication of nanolayered heterostructured hybrid plasmonic waveguides. This includes the measured optical properties of pulsed magnetron sputtered 15 nm films of aluminum oxide and aluminum nitride. Hybrid plasmonic waveguides, where the modes highest intensity is largely confined to the thin aluminum oxide layer, were constructed by maskless lithography using an aperture-type near-field scanning optical microscope.

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