论文信息 - Effect of internal stress on short-circuit diffusion in thin films and nanolaminates: Application to Cu/W nano-multilayers - 字舞流文

Effect of internal stress on short-circuit diffusion in thin films and nanolaminates: Application to Cu/W nano-multilayers

A. V. Druzhinin | J. Janczak-Rusch | L. Jeurgens | C. Cancellieri | B. Straumal | S. Siol | B. Rheingans | A. Druzhinin | J. Janczak‐Rusch