论文信息 - Proximity matching for 193 nm scanner using scatterometry

Proximity matching for 193 nm scanner using scatterometry

In this paper, we evaluate several approaches for proximity matching on a 193nm scanner system such as image contrast tuning, illumination tuning and photoresist tuning. Both experimental and simulation studies are carried out to reveal the differences between approaches. We find that it is very important to determine the root cause of proximity mismatch before attempting proximity matching, and that spectroscopic scatterometry is an excellent tool for OPC tuning

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