Formation and electrical properties of heteroepitaxial SrTiO3/SrVO3−x/Si(100) structures

Heteroepitaxial growth of dielectric SrTiO3(STO)/conductive SrVO3−x(SVO)/Si(100) structures was realized using a focused electron beam evaporation method. It was found from x‐ray diffraction analysis and pole figure measurement that the epitaxial relationships were (100)STO ∥(100)SVO∥(100)Si and 〈011〉STO∥〈011〉SVO∥〈001〉Si. It was also observed from depth profiling by secondary ion mass spectrometry that the interdiffusion of constituent elements among the films and Si substrate was not significant. Electrical properties of the STO film were characterized through I–V (current–voltage) and C–V (capacitance–voltage) measurements, after depositing Al electrodes on the STO/SVO/Si structure. The best values of breakdown field, resistivity, and dielectric constant were 345 kV/cm, 6.4×1012 Ω cm, and 243, respectively.