The technology of fabricating focusators of infrared laser radiation

The possibility of fabricating focusators of infrared laser radiation, based on photolithographic technology, is analysed. The realizability of focusator fabrication is based on the possibility of producing a set of binary photomasks and achieving the necessary depth of etching the substrate of the pattern while forming the microrelief. The possibility of producing these photomasks is evaluated with regard to the focusator's extremal zone width and the appearance of photomasks displayed on the screen. Forming of step-by-step microrelief is achieved using plasma etching or wet etching and depends on the minimum element's dimension and the etching depth. Examples of the microrelief's profiles, of focusators fabricated using photolithography, and the result of the transformation of a focusator's radiation into a straight line segment, are discussed.