Design of compliant parallel mechanism for Nanoimprint Lithography

Nanoimprint Lithography (NIL) is an emerging alternative lithography technology that can be repeated to print nanometer-scale geometries which have very good uniformity and repeatability. The compliant mechanism is a novel mechanism which has been utilized in many accurate mechanisms and precise instruments because of its obvious advantages such as easy assembly, zero friction, zero lubrication, low cost, monolithic manufacturing and reduced weight, etc. This paper mainly introduces the application of compliant mechanisms in NIL and analysis and design of several novel compliant mechanisms.

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