Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation
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Liping Zhang | S. Gendt | S. De Gendt | P. Lefaucheux | R. Dussart | T. Tillocher | J. de Marneffe | M. Baklanov | A. Goodyear | M. Cooke | C. Dussarrat | J. Marneffe | K. Maekawa | F. Leroy | K. Yatsuda