Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS)

[1]  B. Mishra,et al.  Effects of the substrate to chamber wall distance on the structure and properties of CrAlN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS) , 2007 .

[2]  B. Mishra,et al.  Examination of the pulsing phenomena in pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS) of Cr–Al–N thin films , 2007 .

[3]  A. Matthews,et al.  The effect of pulsed magnetron sputtering on the structure and mechanical properties of CrB2 coatings , 2006 .

[4]  Brahmeshwar Mishra,et al.  Microstructure, mechanical and tribological properties of Cr1−xAlxN films deposited by pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS) , 2006 .

[5]  Harish C. Barshilia,et al.  Reactive sputtering of hard nitride coatings using asymmetric-bipolar pulsed DC generator , 2006 .

[6]  J. Esteve,et al.  CrAlN coatings deposited by cathodic arc evaporation at different substrate bias , 2006 .

[7]  T. Moiseev,et al.  On the ion flux and energy gain during pulsed DC operation of an opposed target magnetron , 2006 .

[8]  Jyh-Wei Lee,et al.  The effects of pulse frequency and substrate bias to the mechanical properties of CrN coatings deposited by pulsed DC magnetron sputtering , 2006 .

[9]  K. Bobzin,et al.  The effect of pulse sequence modulation and pulse energy on structural coating properties and coating composition , 2005 .

[10]  Christian Brecher,et al.  Superelastic (Cr,Al)N coatings for high end spindle bearings , 2005 .

[11]  E. Abele,et al.  Effects of the chromium to aluminum content on the tribology in dry machining using (Cr,Al)N coated tools , 2005 .

[12]  A. Matthews,et al.  Design criteria for wear-resistant nanostructured and glassy-metal coatings , 2004 .

[13]  J. Bradley,et al.  Measurement of the plasma potential adjacent to the substrate in a midfrequency bipolar pulsed magnetron , 2003 .

[14]  Lars Hultman,et al.  Microstructural evolution during film growth , 2003 .

[15]  P. Kelly,et al.  Investigation into the properties of titanium based films deposited using pulsed magnetron sputtering , 2003 .

[16]  S. Deevi,et al.  Single layer and multilayer wear resistant coatings of (Ti,Al)N: a review , 2003 .

[17]  C. Muratore,et al.  Electrostatic quadrupole plasma mass spectrometer and Langmuir probe measurements of mid-frequency pulsed DC magnetron discharges , 2003 .

[18]  G. Ramanath,et al.  The influence of thermal annealing on residual stresses and mechanical properties of arc-evaporated TiCxN1−x (x=0, 0.15 and 0.45) thin films , 2002 .

[19]  J. Bradley,et al.  Investigation of the pulsed magnetron discharge by time- and energy-resolved mass spectrometry , 2002 .

[20]  P. Kelly,et al.  The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge , 2002 .

[21]  P. Kelly,et al.  Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron system , 2001 .

[22]  James W. Bradley,et al.  Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma , 2001 .

[23]  A. Matthews,et al.  On the significance of the H/E ratio in wear control: a nanocomposite coating approach to optimised tribological behaviour , 2000 .

[24]  Z. Y. Chen,et al.  Overall energy model for preferred growth of TiN films during filtered arc deposition , 1997 .

[25]  J. Tong,et al.  The deposition of aluminium oxide coatings by reactive unbalanced magnetron sputtering , 1996 .

[26]  Philip J. Martin,et al.  Practical measurement of the residual stress in coatings , 1996 .

[27]  B. Window.  Issues in magnetron sputtering of hard coatings , 1996 .

[28]  W. Sproul,et al.  Physical vapor deposition tool coatings , 1996 .

[29]  D. W. Hoffman,et al.  Thin-Film Deposition: Principles and Practice , 1996 .

[30]  Lars Hultman,et al.  Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering , 1995 .

[31]  Lennart Karlsson,et al.  Ion induced stress generation in arc‐evaporated TiN films , 1995 .

[32]  I. Petrov,et al.  Average energy deposited per atom : a universal parameter for describing ion-assisted film growth ? , 1993 .

[33]  Nathan I. Croitoru,et al.  Reactive-sputter-deposited TiN films on glass substrates , 1991 .

[34]  I. Petrov,et al.  Microstructure modification of TiN by ion bombardment during reactive sputter deposition , 1989 .

[35]  D. T. Quinto,et al.  Mechanical property and structure relationships in hard coatings for cutting tools , 1988 .

[36]  J. Cohen,et al.  Residual Stress: Measurement by Diffraction and Interpretation , 1987 .

[37]  Scott A. Barnett,et al.  Nucleation and initial growth of In deposited on Si3N4 using low‐energy (≤300 eV) accelerated beams in ultrahigh vacuum , 1987 .

[38]  R. J. Sneed,et al.  Nucleation, growth and transformation of amorphous and crystalline solids condensing from the gas phase , 1979 .

[39]  J. Thornton.  High Rate Thick Film Growth , 1977 .