Raman spectral analysis of the as-deposited a-C:H films prepared by CH4 + Ar plasma CVD
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Jun‐Seok Oh | K. Koga | M. Shiratani | N. Itagaki | K. Kamataki | T. Okumura | Susumu Takabayashi | T. Nakatani | S. Hwang | Naoto Yamashita | Shinjiro Ono