Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing
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J. M. Rafí | M. B. González | M. Zabala | H. Castán | H. García | S. Dueñas | L. Bailón | F. Campabadal | O. Beldarrain