Specific design requirements for a reliable slope and curvature measurement standard
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[1] Paul E. Glenn. Robust, sub-angstrom-level midspatial-frequency profilometry , 1990, Optics & Photonics.
[2] Markus C. Knauer,et al. Phase measuring deflectometry: a new approach to measure specular free-form surfaces , 2004, SPIE Photonics Europe.
[3] Kk Konrad Szwedowicz. 3D-deflectometry : fast nanotopography measurement for the semiconductor industry , 2006 .
[4] Ralf D. Geckeler. Error minimization in high-accuracy scanning deflectometry , 2006, SPIE Optics + Photonics.
[5] Weiyao Zou,et al. Differential Shack-Hartmann curvature sensor: local principal curvature measurements. , 2008, Journal of the Optical Society of America. A, Optics, image science, and vision.
[6] Rama Chellappa,et al. A Method for Enforcing Integrability in Shape from Shading Algorithms , 1988, IEEE Trans. Pattern Anal. Mach. Intell..
[7] James H. Burge,et al. Measurement of a 2-meter flat using a pentaprism scanning system , 2007 .
[8] Ulf Griesmann,et al. Form-Profiling of Optics Using the Geometry Measuring Machine and the M-48 CMM at NIST , 2006, Journal of research of the National Institute of Standards and Technology.
[9] Michael Schulz. Topography measurement by a reliable large-area curvature sensor , 2001 .
[10] Stéphane Avril,et al. Grid method: Application to the characterization of cracks , 2004 .
[11] Valeriy V. Yashchuk,et al. Proposal for a universal test mirror for characterization of slope measuring instruments , 2007, SPIE Optical Engineering + Applications.
[12] Tony L. Schmitz,et al. High-speed noninterferometric nanotopographic characterization of Si wafer surfaces , 2002, SPIE Optics + Photonics.
[13] T. Zeschke,et al. The Nanometer Optical Component Measuring Machine: a new Sub-nm Topography Measuring Device for X-ray Optics at BESSY , 2004 .
[14] Mourad Idir,et al. Modern developments in X-ray and neutron optics , 2008 .