论文信息 - Formation of ultrathin CoSi2 films using a two-step limited reaction process - 字舞流文

Formation of ultrathin CoSi2 films using a two-step limited reaction process

K. Maex | R. L. Meirhaeghe | J. Vanhellemont | B. Deweerdt | R. Schreutelkamp | W. D. Bosscher | W. Coppye | L. V. Meirhaeghe | Anne Lauwers