ELM control with RMP: plasma response models and the role of edge peeling response
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A. Loarte | W. Suttrop | Yueqiang Liu | Youwen Sun | A. Kirk | D. Ryan | C. Ham | Li Li | Xu Yang | Lina Zhou
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A. Loarte | W. Suttrop | Yueqiang Liu | Youwen Sun | A. Kirk | D. Ryan | C. Ham | Li Li | Xu Yang | Lina Zhou