论文信息 - Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD - 字舞流文

Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD

R. Wolters | J. Schmitz | A. Kovalgin | J. Holleman | A. Aarnink | I. Brunets | A. Boogaard