A portable, benchtop photolithography system based on a solid-state light source.

Advances in photolithography have enabled the development of microelectromechanical systems (MEMS) [ 1 ] as well as facilitated studies of physical systems at spatial dimensions that mimic natural environments. [ 2–6 ] The primary challenge to producing such structures is the high cost of the infrastructure and processing tools necessary for fabrication, such as dedicated cleanroom facilities and mask aligners. Although soft lithography methods have enabled low-cost solutions for the rapid prototyping of microand nanometer patterns, mask aligners are still often required to fabricate the masters. [ 3 , 4 ]

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