Two‐dimensional laser‐induced fluorescence imaging of metastable density in low‐pressure radio frequency argon plasmas with added O2, Cl2, and CF4

The effect of minor additions of O2, Cl2, and CF4 on the argon metastable relative density and spatial distribution in low‐pressure, radio‐frequency argon plasmas, generated within a parallel‐plate Gaseous Electronics Conference reference reactor, has been investigated using planar laser‐induced fluorescence imaging. For the conditions examined (33.3 Pa, 75–300 V, <10 W), the addition of only a few percent of these electron attaching gases was found to decrease the metastable density by as much as an order of magnitude, despite the fact that the excited‐state argon emission indicated an increase in the metastable production rate. In the dilute O2/Ar discharges examined here, the spatial distribution of metastables was similar to that of the electropositive, pure argon cases, exhibiting a strong axial peak near the interface between the plasma bulk and the sheath at the powered electrode. In contrast, the addition of either Cl2 or CF4 was found to significantly modify the spatial distribution of the emissi...

[1]  R. P. Keatch,et al.  Book reviewPrinciples of plasma discharges and material processing: M.A. Lieberman and A.J. Lichtenberg, John Wiley, New York, 1994, 572 pp , 1996 .

[2]  M. Zachariah,et al.  Two‐dimensional argon metastable density measurements in a radio frequency plasma reactor by planar laser‐induced fluorescence imaging , 1995 .

[3]  M. Meyyappan,et al.  Computational Modeling in Semiconductor Processing , 1994 .

[4]  A. Howling,et al.  The Role of Metastable Atoms in Argon-Diluted Silane Radiofrequency Plasmas , 1994 .

[5]  D. J. Economou,et al.  Effect of Cl2 additions to an argon glow discharge , 1994 .

[6]  L. Overzet,et al.  Spatial variations in the charge density of argon discharges in the Gaseous Electronics Conference reference reactor , 1993 .

[7]  D. J. Economou,et al.  Fluid simulations of glow discharges: Effect of metastable atoms in argon , 1993 .

[8]  Mark A. Sobolewski,et al.  Electrical characterization of radio‐frequency discharges in the Gaseous Electronics Conference Reference Cell , 1992 .

[9]  H. Sawin,et al.  Continuum modeling of radio‐frequency glow discharges. I. Theory and results for electropositive and electronegative gases , 1992 .

[10]  M. Kushner,et al.  Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 using a Monte Carlo-fluid hybrid model , 1992 .

[11]  Paranjpe,et al.  Algorithms for numerical simulation of radio-frequency glow discharges. , 1990, Physical review. A, Atomic, molecular, and optical physics.

[12]  Jerry M. Seitzman,et al.  Planar laser-fluorescence imaging of combustion gases , 1990 .

[13]  J. McVittie,et al.  Scaling laws for radio frequency glow discharges for dry etching , 1990 .

[14]  R. Gottscho,et al.  Nonlinear excitation and dissociation kinetics in discharges through mixtures of rare and attaching gases , 1988 .

[15]  R. Gottscho,et al.  Quenching rates of Ar metastables in radio‐frequency glow discharges , 1988 .

[16]  G. Oehrlein,et al.  Silicon etching mechanisms in a CF4/H2 glow discharge , 1987 .

[17]  I. C. Plumb,et al.  A model for the etching of Si in CF4 plasmas: Comparison with experimental measurements , 1986 .

[18]  L. Christophorou,et al.  Electron transport studies of gas mixtures for use in e‐beam controlled diffuse discharge switches , 1985 .

[19]  J. Loureiro,et al.  Electron transport parameters and excitation rates in argon , 1983 .

[20]  M. Marhic,et al.  Argon‐oxygen interaction in rf sputtering glow discharges , 1981 .

[21]  L. G. Piper,et al.  Quenching cross sections for electronic energy transfer reactions between metastable argon atoms and noble gases and small molecules , 1973 .

[22]  David B. Graves,et al.  The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges , 1994 .

[23]  R. K. Marcus Glow discharge spectroscopies , 1993 .

[24]  P. Bletzinger Experimental characteristics of rf parallel-plate discharges: influence of attaching gases , 1990 .

[25]  D. Manos,et al.  Plasma etching : an introduction , 1989 .

[26]  L. Christophorou,et al.  in Electron - Molecule Interactions and their Applications , 1984 .