论文信息 - Integration of Photo-Patternable Low-κ Material into Advanced Cu Back-End-Of-The-Line - 字舞流文

Integration of Photo-Patternable Low-κ Material into Advanced Cu Back-End-Of-The-Line

Stephan A. Cohen | S. Purushothaman | P. Brock | R. Sooriyakumaran | R. Kwong | R. Wisnieff | Robert D. Miller | Shyng-Tsong Chen | T. Spooner | E. Liniger | D. Neumayer | Alshakim Nelson | Q. Lin | R. Kaplan | H. Shobha | J. Patel | B. Davis