Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 μm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.