Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability
暂无分享,去创建一个
E. Vandamme | Guido Groeseneken | Ben Kaczer | Robin Degraeve | Stefan Kubicek | Mahmoud Rasras | Gonçal Badenes | R. Degraeve | B. Kaczer | E. Vandamme | G. Badenes | S. Kubicek | G. Groeseneken | M. Rasras
[1] W. Weber,et al. The Mechanisms of Hot-Carrier Degradation , 1992 .
[2] K. Okada,et al. A concept of gate oxide lifetime limited by "B-mode" stress induced leakage currents in direct tunneling regime , 1999, 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325).
[3] Stephan A. Cohen,et al. Gate oxide breakdown under Current Limited Constant Voltage Stress , 2000, 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).
[4] J. Bude,et al. Gate oxide reliability projection to the sub-2 nm regime , 2000 .
[5] M. Alam,et al. The statistical distribution of percolation resistance as a probe into the mechanics of ultra-thin oxide breakdown , 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).
[6] B. Kaczer,et al. Quantitative yield and reliability projection from antenna test results-a case study , 2000, 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).
[7] R. Degraeve,et al. Relation between breakdown mode and breakdown location in short channel NMOSFETs and its impact on reliability specifications , 2001, 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167).
[8] A. De Keersgieter,et al. Consistent model for short-channel nMOSFET post-hard-breakdown characteristics , 2001, 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184).
[9] J. Stathis. Physical and predictive models of ultra thin oxide reliability in CMOS devices and circuits , 2001, 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167).
[10] R. Degraeve,et al. Explanation of nMOSFET substrate current after hard gate oxide breakdown , 2001 .
[11] D. Frank,et al. Transistor-limited constant voltage stress of gate dielectrics , 2001, 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184).