Fine-tuned profile simulation of holographically exposed photoresist gratings
暂无分享,去创建一个
[1] C. Mack. Development of Positive Photoresists , 1987 .
[2] R. Bartolini,et al. Improved development for holograms recorded in photoresist. , 1972, Applied optics.
[3] Theoretical modeling of the simultaneous exposure and development (SED) process of a positive photoresist. , 1977, Applied optics.
[4] P. S. Hauge,et al. Characterization of positive photoresist , 1975, IEEE Transactions on Electron Devices.
[5] S. Austin,et al. Fabrication of thin periodic structures in photoresist: a model. , 1976, Applied optics.
[6] Will Conley,et al. Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP) , 1996, Advanced Lithography.
[7] L. Cescato,et al. Developed profile of holographically exposed photoresist gratings. , 1995, Applied optics.
[8] W. Henke,et al. A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the SOLID lithography simulator , 1991 .
[9] Clifford L. Henderson,et al. Photoresist characterization for lithography simulation: III. Development parameter measurements , 1997, Advanced Lithography.
[10] Svetlen Tonchev,et al. Formation of holographic diffraction gratings in photoresist , 1981 .
[11] H. Binder,et al. Modeling and simulation of a chemically amplified DUV resist using the effective acid concept , 1995 .