A kind of collimation method improving eccentric rotary magnetic control sputtering system

The invention discloses a kind of collimation method improving eccentric rotary magnetic control sputtering system belonging to electric mechanical field, the method is: 1) press close to wall place in the SIP sputtering chamber outside with small area motion magnetron and add auxiliary magnetic pole, and the decoration form of auxiliary magnetic pole is set, determine dependency structure parameter, make auxiliary magnetic pole produce axial magnetic field in SIP sputtering chamber inside; 2) according to the step mode of the constitutional features determination any instant auxiliary magnetic pole of magnetron; 3) according to the motion characteristics of magnetron arrange auxiliary magnetic pole not in the same time energising combination switch law.The present invention is by adding auxiliary magnetic pole outward at SIP sputtering chamber, create the axial magnetic field matched with magnetron shape, do not adopting different energising combinations in the same time, localized axial magnetic field can be provided to different zones, improve the ionization level of sputtering particle, improve the collimation that ion flies to substrate, reduce sidewall loss, improve the coating effects to high aspect ratio figure.