NANOMETROLOGY OF MICROSYSTEMS: INTERFEROMETRY

The future of microelectronics and nanotechnology are intimately tied together. The smallest feature size (CD) is already below 50 nm. Many scientists in the field of nano- sciences are reporting < 1 nm accuracy in their experiments, which is suspiciously good. The reason is probably the general confusion between resolution and accuracy. No commercial instruments have yet nanometer accuracy but there are many having 0.1 nm resolution. The International Technology Roadmap for Semiconductors projects that in 15 years the smallest feature size will be < 10 nm, meaning we can measure it. This is the reason why we must pay a very special attention to the calibration process of the instruments we use. Accurate and traceable calibration of lateral and vertical standards (1D and 2D gratings) is a basic metrological task for nano-metrology. For this reason, the interferometric methods for artifact calibration are reviewed in this paper.

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