Low Leakage Current and High-Cutoff Frequency AlGaN/GaN MOSHEMT Using Submicrometer-Footprint Thermal Oxidized TiO2/NiO as Gate Dielectric
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K. Lau | C. Wen | Wengang Wu | Maojun Wang | Jinyan Wang | Y. Hao | Di Meng | Shuxun Lin | Yaohui Zhang