Preparation and properties of amorphous SmTbFeCo thin films

SmTbFeCO amorphous films were r.f.-magnetron sputtered from a mosaic target onto glass substrate. The magnetic and magneto-optical properties of SmTbFeCo thin films deposited at different argon pressure, sputtering power and negative substrate bias voltage were studied. It is shown that the deposition conditions strongly affect the reflectivity R, the coercivity Hc and Kerr rotation angle (theta) k. In order to meet the requirement of magneto-optical recording, it is optimal to choose Ar pressure of 0.47 approximately 0.73 Pa, sputtering power of 300 approximately 350W, and negative substrate bias voltage of -80V approximately -110V.