A virtual factory-based environment for semiconductor device development

The Simulation Experiment Workbench (SEWB), an integrated design environment for rapid prototyping of semiconductor devices, supports device design within a single user environment by offering a device structure editor, an automatic mesh generator, a collection of statistical experimental design packages, a device simulator, and a task dispatcher/monitor. It maintains a library mechanism to organize and record design knowledge about devices, tests, and experiments for future reuse. With SEWB, one can conduct device experiments in the virtual factory by simply sketching the device structure and selecting an experimental design methodology. SEWB handles the remaining operational details, including the automatic generation of structure variations, simulator input files, and discretization mesh. It dispatches concurrent simulation runs to a network of heterogeneous workstations.<<ETX>>

[1]  Mark A. Linton,et al.  Interviews: A C++ graphical interface toolkit , 1988 .

[2]  Steven G. Duvall,et al.  EASE--An Application-Based CAD System for Process Design , 1987, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

[3]  J. M. Tenenbaum,et al.  A framework for knowledge-based computer-integrated manufacturing , 1989 .

[4]  T. Arnborg,et al.  HALVFEM—a computer program for two-dimensional finite element analysis of semiconductor devices , 1981 .

[5]  Ping Yang,et al.  SIERRA: a 3-D device simulator for reliability modeling , 1989, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[6]  R.W. Dutton,et al.  A utility-based integrated process simulation system , 1990, Digest of Technical Papers.1990 Symposium on VLSI Technology.

[7]  A. Owen A Central Limit Theorem for Latin Hypercube Sampling , 1992 .

[8]  A. J. Strojwas The process engineer's workbench , 1988 .

[9]  P. Losleben Semiconductor manufacturing in the 21st century: capital investment vs. technological innovation , 1990, Ninth IEEE/CHMT International Symposium on Electronic Manufacturing Technology,Competitive Manufacturing for the Next Decade.

[10]  K. Lee,et al.  SIMPL-2 (SIMulated Profiles from the Layout-Version 2) , 1985, 1985 Symposium on VLSI Technology. Digest of Technical Papers.

[11]  E. M. Buturla,et al.  Finite-element analysis of semiconductor devices: the FIELDAY program , 1981 .

[12]  M. Simpson,et al.  PRIDE: An Integrated Design Environment for Semiconductor Device Simulation , 1990, Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits.

[13]  Jay M. Tenenbaum,et al.  MKS: A conceptually centralized knowledge service for distributed CIM environments , 1991, J. Intell. Manuf..

[14]  Andrew R. Neureuther,et al.  Simulated profiles from the layout-design interface in X (SIMPL-DIX) , 1988, Technical Digest., International Electron Devices Meeting.

[15]  Dennis L. Young,et al.  Application of statistical design and response surface methods to computer-aided VLSI device design , 1988, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[16]  Siegfried Selberherr,et al.  MINIMOS—A two-dimensional MOS transistor analyzer , 1980 .

[17]  Robert W. Dutton,et al.  A manufacturing-oriented environment for synthesis of fabrication processes , 1989, 1989 IEEE International Conference on Computer-Aided Design. Digest of Technical Papers.

[18]  J. S. Hunter,et al.  Statistics for experimenters : an introduction to design, data analysis, and model building , 1979 .