Mixed-mode, high-order multi-patterning control strategy with small-spot, optical CD metrology on device structures
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Taeddy Kim | Rui Zhang | Yi Song | Hugo Cramer | Baukje Wisse | Stefan Kruijswijk | Sang-Hoon Jung | Jong-Mun Jeong | Kyu-Tae Sun | Jin-Moo Byun | Alok Verma | Wei Guo | Rahul Khandelwal | Thomas Theeuwes | Hyun-Sok Kim | Sharon Hsu | Moo-Young Seo | Giacomo Miceli | Yvon Chai | Steven Welch | Dong-Gyu Park
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