论文信息 - Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma - 字舞流文

Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma

H. Meyer | J. Dellith | M. Rettenmayr | A. Ihring | M. Ziegler | U. Huebner | S. Goerke | S. Anders | A. Undisz | M. Diegel