Control system design for a rapid thermal processing system

Proposes a control system design for a rapid thermal processing (RTP) system, which has four circular concentric lamp zones and four temperature sensors. The control system consists of a least square feedforward controller and an output feedback proportional plus integral (PI) controller. The goal is to maintain uniform temperature tracking for typical ramp-up and hold-steady profiles. A high-order nonlinear model describing the temperature dynamics of the rapid thermal processing (RTP) system is used for the feedforward controller design. A balanced reduced model, obtained from a linear model around a desired uniform steady-state temperature, is used for the design of the multiinput-multioutput PI controller. The PI controller gain matrices are designed using an LQR-based procedure. Tradeoff between robustness and performance of the system is discussed. Simulation results show the control system designed yields robust temperature tracking with good uniformity for a wide temperature range.

[1]  J. Aplevich,et al.  Lecture Notes in Control and Information Sciences , 1979 .

[2]  Tong Heng Lee,et al.  Terminal iterative learning control with an application to RTPCVD thickness control , 1999, Autom..

[3]  Krishna C. Saraswat,et al.  Rapid thermal processing uniformity using multivariable control of a circularly symmetric 3 zone lamp , 1992 .

[4]  Thomas Kailath,et al.  Linear Systems , 1980 .

[5]  Thomas F. Edgar,et al.  Model-based control of rapid thermal processes , 1994, Proceedings of 1994 American Control Conference - ACC '94.

[6]  Charles D. Schaper Real-Time Control of Rapid Thermal Processing Semiconductor Manufacturing Equipment , 1993, 1993 American Control Conference.

[7]  Ching-An Lin,et al.  Lamp configuration design for rapid thermal processing systems , 1998 .

[8]  Thomas F. Edgar,et al.  Model-based control of rapid thermal processes , 1994, Proceedings of 1994 33rd IEEE Conference on Decision and Control.

[9]  Mehrdad M. Moslehi,et al.  Control of MMST RTP: repeatability, uniformity, and integration for flexible manufacturing [ICs] , 1994 .

[10]  H. A. Lord,et al.  Thermal And Stress Analysis Of Semiconductor Wafers In A Rapid Thermal Processing Oven , 1988, Other Conferences.

[11]  Bernard Friedland,et al.  Closed-loop adaptive control for rapid thermal processing , 1995, Proceedings of 1995 34th IEEE Conference on Decision and Control.

[12]  Mehrdad M. Moslehi,et al.  Modeling, Identification, and Control of Rapid Thermal Processing Systems , 1994 .

[13]  Richard B. Fair,et al.  Rapid thermal processing : science and technology , 1993 .

[14]  J. Doyle,et al.  Robust and optimal control , 1995, Proceedings of 35th IEEE Conference on Decision and Control.

[15]  Thomas Kailath,et al.  Decentralized control of wafer temperature for multizone rapid thermal processing systems , 1999, ICMTS 1999.