Michael E. Elta

Theoretical and practical aspects of real-time Fourier imaging

Fred L. Terry, Dennis S. Grimard, Michael E. Elta, 1991, Other Conferences.

Expert system and process optimization techniques for real-time monitoring and control of plasma processes

Jie Cheng, Keki B. Irani, Zhaogang Qian, 1991, Other Conferences.

Real-time feedback control of reactive ion etching

Tyrone L. Vincent, Pramod P. Khargonekar, M. D. Giles, 1994, Other Conferences.

Utilizing diffraction imaging for nondestructive wafer topography measurements

Chiao-fe Shu, Ramesh Jain, Fred L. Terry, 1993, Advanced Lithography.

Run-to-run control framework for VLSI manufacturing

James Moyne, Michael E. Elta, Hossein Etemad, 1994, Other Conferences.

Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher

James Moyne, Pramod P. Khargonekar, Jessy W. Grizzle, 1995 .

Real-time control of reactive ion etching: identification and disturbance rejection

Pramod P. Khargonekar, Jessy W. Grizzle, Jim Freudenberg, 1993, Proceedings of 32nd IEEE Conference on Decision and Control.

A Monte Carlo microtopography model for investigating plasma/reactive ion etch profile evolution

Michael E. Elta, M. Elta, M. Barnes, 1988 .

The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges

David B. Graves, Mark A. Sobolewski, James K. Olthoff, 1994 .

The optimization of InxGa1-xAs and InP growth conditions by CBE

George I. Haddad, Michael E. Elta, G. Haddad, 1991 .