Application of artificial neural networks to compact mask models in optical lithography simulation
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Andreas Erdmann | Peter Evanschitzky | Viviana Agudelo | Tim Fühner | A. Erdmann | T. Fühner | P. Evanschitzky | V. Agudelo
[1] Yuri Granik,et al. Process window modeling using compact models , 2004, SPIE Photomask Technology.
[2] Kevin D. Lucas,et al. Rigorous and practical vector model for phase-shifting masks in optical lithography , 1992, Advanced Lithography.
[3] F. F. Hiltz. Analog Computer Simulation of a Neural Element , 1962 .
[4] E. J. Nalos. Neural theory and modeling, proceedings of the 1962 Ojai symposium , 1965 .
[5] A. Neureuther,et al. Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering , 2002 .
[6] Elie Bienenstock,et al. Neural Networks and the Bias/Variance Dilemma , 1992, Neural Computation.
[7] Feng Shao,et al. Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique , 2008, European Mask and Lithography Conference.
[8] Feng Shao,et al. Accuracy and performance of 3D mask models in optical projection lithography , 2011, Advanced Lithography.
[9] Andreas Erdmann,et al. Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography , 2012, Advanced Lithography.
[10] C. Burckhardt. Diffraction of a Plane Wave at a Sinusoidally Stratified Dielectric Grating , 1966 .
[11] T. Gaylord,et al. Rigorous coupled-wave analysis of planar-grating diffraction , 1981 .
[12] Kevin D. Lucas,et al. Efficient and rigorous three-dimensional model for optical lithography simulation , 1996 .
[13] S.,et al. Numerical Solution of Initial Boundary Value Problems Involving Maxwell’s Equations in Isotropic Media , 1966 .
[14] David Fryer,et al. Accurate 3DEMF mask model for full-chip simulation , 2013, Advanced Lithography.
[15] Peter De Bisschop,et al. Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask , 2006, SPIE Advanced Lithography.
[16] John J. Hopfield,et al. Neural networks and physical systems with emergent collective computational abilities , 1999 .
[17] C.-M. Yuan,et al. Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography , 1992 .
[18] Jens Timo Neumann,et al. Polarization-induced astigmatism caused by topographic masks , 2007, SPIE Photomask Technology.
[19] Paul J. Werbos,et al. The Roots of Backpropagation: From Ordered Derivatives to Neural Networks and Political Forecasting , 1994 .
[20] R. Lippmann,et al. An introduction to computing with neural nets , 1987, IEEE ASSP Magazine.
[21] Geoffrey E. Hinton,et al. Learning representations by back-propagating errors , 1986, Nature.